Analytical control of the surface cleaning quality under ionic, ion-plasma exposure

Арустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., Худайкулов, И.Х.

O‘zbekiston fizika jurnali · 2019-yil

Annotatsiya

The paper presents methods of cleaning the surface of substrates before coating with vacuum-plasma methods. The mechanical and chemical cleaning methods are considered: heat treatment and glow discharge treatment. The IR and Raman spectra obtained from analytical studies of the surface state of the samples are presented. Based on the analysis of the intensities of the IR and Raman spectra, the dependence of the degree of surface purity of the samples on the cleaning method applied is demonstrated.

Maqola ma’lumotlari
MualliflarАрустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., Худайкулов, И.Х.
JurnalO‘zbekiston fizika jurnali
NashriyotЎзбекистон Республикаси Фанлар академияси
ISSN1025-8817, 2181-077X
Nashr sanasi2019-10-21
Jild21
Son5
Betlar310-317
TilIngliz
Ilmiy sohaFizika-matematika
DOI10.52304/.v21i5.135
Indeksga qo‘shilgan2026-08-26

Ilmiy soha

Iqtibos keltirish

APAАрустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., & Худайкулов, И.Х. (2019). ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE. O‘zbekiston fizika jurnali, 21(5), 310-317. https://doi.org/10.52304/.v21i5.135
GOST (OAK)Арустамов, В.Н. va b. ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE // O‘zbekiston fizika jurnali. – 2019. – T. 21, № 5. – P. 310-317. – DOI: 10.52304/.v21i5.135.
MLAАрустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., and Худайкулов, И.Х. “ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE.” O‘zbekiston fizika jurnali, 21(5), 310-317, 2019. https://doi.org/10.52304/.v21i5.135
ChicagoАрустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., and Худайкулов, И.Х. “ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE.” O‘zbekiston fizika jurnali, 21(5), 310-317 (2019). https://doi.org/10.52304/.v21i5.135
HarvardАрустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., and Худайкулов, И.Х (2019) ‘ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE’, O‘zbekiston fizika jurnali, 21(5), 310-317. https://doi.org/10.52304/.v21i5.135
BibTeX
@article{article2019,
  title = {ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE},
  author = {Арустамов, В.Н. and Ашуров, Р.Х. and Ротштейн, В.М. and Ашуров, Х.Б. and Худайкулов, И.Х.},
  journal = {O‘zbekiston fizika jurnali},
  year = {2019},
  volume = {21},
  number = {5},
  pages = {310-317},
  doi = {10.52304/.v21i5.135},
  url = {https://doi.org/10.52304/.v21i5.135}
}

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