The paper presents methods of cleaning the surface of substrates before coating with vacuum-plasma methods. The mechanical and chemical cleaning methods are considered: heat treatment and glow discharge treatment. The IR and Raman spectra obtained from analytical studies of the surface state of the samples are presented. Based on the analysis of the intensities of the IR and Raman spectra, the dependence of the degree of surface purity of the samples on the cleaning method applied is demonstrated.
| Mualliflar | Арустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., Худайкулов, И.Х. |
|---|---|
| Jurnal | O‘zbekiston fizika jurnali |
| Nashriyot | Ўзбекистон Республикаси Фанлар академияси |
| ISSN | 1025-8817, 2181-077X |
| Nashr sanasi | 2019-10-21 |
| Jild | 21 |
| Son | 5 |
| Betlar | 310-317 |
| Til | Ingliz |
| Ilmiy soha | Fizika-matematika |
| DOI | 10.52304/.v21i5.135 |
| Indeksga qo‘shilgan | 2026-08-26 |
DOI: 10.52304/.v21i5.135 · Maqolaning asl sahifasi
| APA | Арустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., & Худайкулов, И.Х. (2019). ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE. O‘zbekiston fizika jurnali, 21(5), 310-317. https://doi.org/10.52304/.v21i5.135 |
|---|---|
| GOST (OAK) | Арустамов, В.Н. va b. ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE // O‘zbekiston fizika jurnali. – 2019. – T. 21, № 5. – P. 310-317. – DOI: 10.52304/.v21i5.135. |
| MLA | Арустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., and Худайкулов, И.Х. “ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE.” O‘zbekiston fizika jurnali, 21(5), 310-317, 2019. https://doi.org/10.52304/.v21i5.135 |
| Chicago | Арустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., and Худайкулов, И.Х. “ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE.” O‘zbekiston fizika jurnali, 21(5), 310-317 (2019). https://doi.org/10.52304/.v21i5.135 |
| Harvard | Арустамов, В.Н., Ашуров, Р.Х., Ротштейн, В.М., Ашуров, Х.Б., and Худайкулов, И.Х (2019) ‘ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE’, O‘zbekiston fizika jurnali, 21(5), 310-317. https://doi.org/10.52304/.v21i5.135 |
| BibTeX | @article{article2019,
title = {ANALYTICAL CONTROL OF THE SURFACE CLEANING QUALITY UNDER IONIC, ION-PLASMA EXPOSURE},
author = {Арустамов, В.Н. and Ашуров, Р.Х. and Ротштейн, В.М. and Ашуров, Х.Б. and Худайкулов, И.Х.},
journal = {O‘zbekiston fizika jurnali},
year = {2019},
volume = {21},
number = {5},
pages = {310-317},
doi = {10.52304/.v21i5.135},
url = {https://doi.org/10.52304/.v21i5.135}
} |
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