INVESTIGATION OF THE INFLUENCE OF Si-SiO2 TRANSITION LAYERS ON THE CAPACITY-VOLTAGE CHARACTERISTICS IN THREE-LAYER SILICON STRUCTURES

SRI OF PHYSICS OF SEMICONDUCTORS AND MICROELECTRONICS AT NUUZ named after MIRZO ULUGBEK, Kh.S. Daliev, Ф.А. Сапаров

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали · 2021-yil

Annotatsiya

INVESTIGATION OF THE INFLUENCE OF Si-SiO2 TRANSITION LAYERS ON THE CAPACITY-VOLTAGE CHARACTERISTICS IN THREE-LAYER SILICON STRUCTURES

Maqola ma’lumotlari
MualliflarSRI OF PHYSICS OF SEMICONDUCTORS AND MICROELECTRONICS AT NUUZ named after MIRZO ULUGBEK, Kh.S. Daliev, Ф.А. Сапаров
Jurnal(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали
Nashr sanasi2021-10-30
Jild3
Son5
Betlar34-40
Tilen
DOI10.37681/2181-1652-019-x-2021-5-6

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали jurnalidan boshqa maqolalar

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