The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate

Турдалиев, Т.К., Ашуров, Р.Х., Зохидов, Х.Х.

O‘zbekiston fizika jurnali · 2023-yil

Annotatsiya

The macroporous silicon substrate was obtained through electrochemical etching and exhibited a uniform distribution of pores. For the deposition of the TiO2 film onto substrate, the thermal atomic layer deposition (ALD) method was applied, and the process characteristics were examined and optimized. The research were substantiated through spectral ellipsometry, scanning electron microscopy, and elemental analysis using SEM EDS. This studies showed the efficiency of the ALD method in achieving the homogeneous deposition of thin TiO2 films onto macroporous silicon substrates.

Maqola ma’lumotlari
MualliflarТурдалиев, Т.К., Ашуров, Р.Х., Зохидов, Х.Х.
JurnalO‘zbekiston fizika jurnali
NashriyotЎзбекистон Республикаси Фанлар академияси
ISSN1025-8817, 2181-077X
Nashr sanasi2023-10-07
Jild25
Son3
TilIngliz
Ilmiy sohaFizika-matematika
DOI10.52304/.v25i3.456
Indeksga qo‘shilgan2026-08-26

DOI: 10.52304/.v25i3.456 · Maqolaning asl sahifasi

Kalit so‘zlar

тонкая пленка, оксид титана, макропористый кремний, атомно-слоевое осаждение, сканирующая электронная микроскопия, спектральная эллипсометрия, thin film, titanium dioxide, macroporous silicon, atomic layer deposition, scanning electron microscopy, spectral ellipsometry

Ilmiy soha

Fizika-matematika

Iqtibos keltirish

APAТурдалиев, Т.К., Ашуров, Р.Х., & Зохидов, Х.Х. (2023). The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate. O‘zbekiston fizika jurnali, 25(3). https://doi.org/10.52304/.v25i3.456
GOST (OAK)Турдалиев, Т.К., Ашуров, Р.Х., Зохидов, Х.Х. The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate // O‘zbekiston fizika jurnali. – 2023. – T. 25, № 3. – DOI: 10.52304/.v25i3.456.
MLAТурдалиев, Т.К., Ашуров, Р.Х., and Зохидов, Х.Х. “The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate.” O‘zbekiston fizika jurnali, 25(3), 2023. https://doi.org/10.52304/.v25i3.456
ChicagoТурдалиев, Т.К., Ашуров, Р.Х., and Зохидов, Х.Х. “The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate.” O‘zbekiston fizika jurnali, 25(3) (2023). https://doi.org/10.52304/.v25i3.456
HarvardТурдалиев, Т.К., Ашуров, Р.Х., and Зохидов, Х.Х (2023) ‘The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate’, O‘zbekiston fizika jurnali, 25(3). https://doi.org/10.52304/.v25i3.456
BibTeX
@article{article2023,
  title = {The Study of the thermal atomic layer deposition method for creating functional TiO2 coatings on a macroporous silicon substrate},
  author = {Турдалиев, Т.К. and Ашуров, Р.Х. and Зохидов, Х.Х.},
  journal = {O‘zbekiston fizika jurnali},
  year = {2023},
  volume = {25},
  number = {3},
  doi = {10.52304/.v25i3.456},
  url = {https://doi.org/10.52304/.v25i3.456}
}

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