OBTAINING THIN HMIS FILMS BY MAGNETRON SPRAYING

Камилов, Т.С., Рысбаев, А.С., Камардин, А.И., Бурков, А.Т., Новиков, С.В., Клечковская, В.В., Орехов, А.С., Игамов, Б.Д., Бекпулатов, И.Р.

O‘zbekiston fizika jurnali · 2019-yil

Annotatsiya

The technique for producing thin films of higher manganese silicide by magnetron sputtering is considered. The films were obtained on dielectric substrates: sitall СT-35-2 and mica. New results on the structural and transport properties of the films have been obtained.

Maqola ma’lumotlari
MualliflarКамилов, Т.С., Рысбаев, А.С., Камардин, А.И., Бурков, А.Т., Новиков, С.В., Клечковская, В.В., Орехов, А.С., Игамов, Б.Д., Бекпулатов, И.Р.
JurnalO‘zbekiston fizika jurnali
Nashr sanasi2019-06-21
Jild21
Son3
Betlar153-157
TilRus
DOI10.52304/.v21i3.74

Ilmiy soha

O‘zbekiston fizika jurnali jurnalidan boshqa maqolalar

O‘zbekiston fizika jurnali — barcha maqolalar