TECHNOLOGICAL METHOD OF ERROSION - FREE DIFFUSION OF SILICON WITH IMPURITY ATOMS OF SULFUR

N.F. Zikrillaev, М.К. Ha kk ulov, F. K. Shakarov, S.Y. Ma kh mudov

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали · 2021-yil

Annotatsiya

A diffusion technology for doping silicon with impurity atoms of sulfur preventing surface erosion has been developed. The technology could be used to create relevant semiconductor devices. Controlling diffusant vapor pressure, diffusion time and temperatu re, it is possible to obtain silicon samples of both p - type conductivity and n - type doped with impurity atoms of sulfur. The developed technology is recommended for application in obtaining silicon doped with other diffusants, which, during diffusion, stro ngly interact with the original silicon, forming surface erosion

Maqola ma’lumotlari
MualliflarN.F. Zikrillaev, М.К. Ha kk ulov, F. K. Shakarov, S.Y. Ma kh mudov
Jurnal(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали
Nashr sanasi2021-06-30
Jild3
Son3
Betlar39-44
Tilen
DOI10.37681/2181-1652-019-x-2021-3-7

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали jurnalidan boshqa maqolalar

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