DISTRIBUTION OF IMPURITY ATOMS BY THE VOLUME OF MICROINCUTIONS IN SAMPLES n-Si

S.Z. Zainabidinov, N. A. Turgunov, Sh. Akbarov, E.Kh. Berkinov, D.Kh. Mamazhonova

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали · 2021-yil

Annotatsiya

The paper considers the structural structure o f nickel impurity microinclusions in silicon, form ed during diffusion alloying at a temperature o f T = 1523 K. Using microprobe analysis, images o f nickel impurity microinclusions were obtained, and their chemical compositions were determined. The distribution o f Ni atoms and some technological impurities such as Fe and Cr over the volume o f multilayer microinclusions was revealed, according to which the maximum percentage o f impurity atoms is in its central part.

Maqola ma’lumotlari
MualliflarS.Z. Zainabidinov, N. A. Turgunov, Sh. Akbarov, E.Kh. Berkinov, D.Kh. Mamazhonova
Jurnal(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали
Nashr sanasi2021-02-28
Jild3
Son1
Betlar10-15
Tilen
DOI10.37681/2181-1652-019-x-2021-1-1

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали jurnalidan boshqa maqolalar

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