Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si

Абдурахманов, Б.М., Ашуров, Х.Б., Кучканов, Ш.К., Максимов, С.Е., Ниматов, С.Ж.

O‘zbekiston fizika jurnali · 2020-yil

Annotatsiya

The appearance of thermoelectric power on heated p-n heterostructures containing on the surface of silicon substrates the deposited films from a Si-Ge solid solution heavily doped with titanium was experimentally observed. The appearance of the thermoelectric power, even with uniform heating of the samples, had been explained by the thermal-voltaic effect, that is the generation of charge carriers due to the absorption of subband photons with the participation of deep energy levels caused by both structural defects of Si-Ge films and an impurity of titanium. It is shown that when the p-n structures are heated to 800 K, the emf is several mV, and the additional local illumination of the surface leads to an increase in the current by a factor of 15.

Maqola ma’lumotlari
MualliflarАбдурахманов, Б.М., Ашуров, Х.Б., Кучканов, Ш.К., Максимов, С.Е., Ниматов, С.Ж.
JurnalO‘zbekiston fizika jurnali
NashriyotЎзбекистон Республикаси Фанлар академияси
ISSN1025-8817, 2181-077X
Nashr sanasi2020-12-17
Jild22
Son6
Betlar362-368
TilIngliz
Ilmiy sohaFizika-matematika
DOI10.52304/.v22i6.208
Indeksga qo‘shilgan2026-08-26

Kalit so‘zlar

генерация носителей заряда, тепловольтаический эффект, глубокие энергетические уровни, структурные дефекты, кремний-германиевые эпитаксиальные пленки, легирование примесью титана, термо-эдс., generation of charge carriers, thermal-voltaic effect, deep energy levels, structural defects, silicon-germanium epitaxial films, titanium impurity doping, thermoelectric power.

Ilmiy soha

Iqtibos keltirish

APAАбдурахманов, Б.М., Ашуров, Х.Б., Кучканов, Ш.К., Максимов, С.Е., & Ниматов, С.Ж. (2020). Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si. O‘zbekiston fizika jurnali, 22(6), 362-368. https://doi.org/10.52304/.v22i6.208
GOST (OAK)Абдурахманов, Б.М. va b. Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si // O‘zbekiston fizika jurnali. – 2020. – T. 22, № 6. – P. 362-368. – DOI: 10.52304/.v22i6.208.
MLAАбдурахманов, Б.М., Ашуров, Х.Б., Кучканов, Ш.К., Максимов, С.Е., and Ниматов, С.Ж. “Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si.” O‘zbekiston fizika jurnali, 22(6), 362-368, 2020. https://doi.org/10.52304/.v22i6.208
ChicagoАбдурахманов, Б.М., Ашуров, Х.Б., Кучканов, Ш.К., Максимов, С.Е., and Ниматов, С.Ж. “Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si.” O‘zbekiston fizika jurnali, 22(6), 362-368 (2020). https://doi.org/10.52304/.v22i6.208
HarvardАбдурахманов, Б.М., Ашуров, Х.Б., Кучканов, Ш.К., Максимов, С.Е., and Ниматов, С.Ж (2020) ‘Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si’, O‘zbekiston fizika jurnali, 22(6), 362-368. https://doi.org/10.52304/.v22i6.208
BibTeX
@article{article2020,
  title = {Features of the technology and some properties of heteroepitaxial structures Si-Ge / Si},
  author = {Абдурахманов, Б.М. and Ашуров, Х.Б. and Кучканов, Ш.К. and Максимов, С.Е. and Ниматов, С.Ж.},
  journal = {O‘zbekiston fizika jurnali},
  year = {2020},
  volume = {22},
  number = {6},
  pages = {362-368},
  doi = {10.52304/.v22i6.208},
  url = {https://doi.org/10.52304/.v22i6.208}
}

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