STUDY OF THE INFLUENCE OF PROTON RADIATION ON THE FORMATION OF RADIATION DEFECTS IN DIFFUSION SILICON DIODES

M.Yu. Tashmetov, Sh. Makhkamov, A.R. Sattiev, M.N. Erdonov, Sh. A. Makhmudov, Kh. M. Kholmedov, Tashkent Al - Khwarizmi Uni versity of Information Technologies, Tashkent, Uzbekistan

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали · 2021-yil

Annotatsiya

The results of a capacitive spectrometric study of the formation of radiation - defect complexes in diffusion silicon p + - n - n + structures under the action of 18.7 MeV protons are presented. It was found that for the A center after irradiation, the efficiency of RD formation in diffusion diodes with shallow depths of the p + layer has a nonmonotonic dependence and constitutes the main RD concentration. A mechanism is considered that explains the effect of the p + - layer depth in diffusion diodes on the defect fo rmation process.

Maqola ma’lumotlari
MualliflarM.Yu. Tashmetov, Sh. Makhkamov, A.R. Sattiev, M.N. Erdonov, Sh. A. Makhmudov, Kh. M. Kholmedov, Tashkent Al - Khwarizmi Uni versity of Information Technologies, Tashkent, Uzbekistan
Jurnal(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали
Nashr sanasi2021-06-30
Jild3
Son3
Betlar45-50
Tilen
DOI10.37681/2181-1652-019-x-2021-3-8

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