INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR

Абдикаримов, А.Э., Юсупов, А., Атамуратов, А.Э.

O‘zbekiston fizika jurnali · 2019-yil

Annotatsiya

Influence of gate lateral extension on the threshold voltage and short-channel effects in SOI FinFET with different shape are simulated by Advanced TCAD Sentaurus method. It is shown gate lateral extension practically is not influence to threshold voltage and DIBL and SS is decreased with increasing the extension. Lowest and highest DIBL and SS are observed for transistor with triangular and rectangular cross section correspondingly.

Maqola ma’lumotlari
MualliflarАбдикаримов, А.Э., Юсупов, А., Атамуратов, А.Э.
JurnalO‘zbekiston fizika jurnali
Nashr sanasi2019-02-21
Jild21
Son1
Betlar50-52
TilRus
DOI10.52304/.v21i1.50

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