Influence of gate lateral extension on the threshold voltage and short-channel effects in SOI FinFET with different shape are simulated by Advanced TCAD Sentaurus method. It is shown gate lateral extension practically is not influence to threshold voltage and DIBL and SS is decreased with increasing the extension. Lowest and highest DIBL and SS are observed for transistor with triangular and rectangular cross section correspondingly.
| Mualliflar | Абдикаримов, А.Э., Юсупов, А., Атамуратов, А.Э. |
|---|---|
| Jurnal | O‘zbekiston fizika jurnali |
| Nashriyot | Ўзбекистон Республикаси Фанлар академияси |
| ISSN | 1025-8817, 2181-077X |
| Nashr sanasi | 2019-02-21 |
| Jild | 21 |
| Son | 1 |
| Betlar | 50-52 |
| Til | Ingliz |
| Ilmiy soha | Fizika-matematika |
| DOI | 10.52304/.v21i1.50 |
| Indeksga qo‘shilgan | 2026-08-26 |
DOI: 10.52304/.v21i1.50 · Maqolaning asl sahifasi
| APA | Абдикаримов, А.Э., Юсупов, А., & Атамуратов, А.Э. (2019). INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR. O‘zbekiston fizika jurnali, 21(1), 50-52. https://doi.org/10.52304/.v21i1.50 |
|---|---|
| GOST (OAK) | Абдикаримов, А.Э., Юсупов, А., Атамуратов, А.Э. INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR // O‘zbekiston fizika jurnali. – 2019. – T. 21, № 1. – P. 50-52. – DOI: 10.52304/.v21i1.50. |
| MLA | Абдикаримов, А.Э., Юсупов, А., and Атамуратов, А.Э. “INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR.” O‘zbekiston fizika jurnali, 21(1), 50-52, 2019. https://doi.org/10.52304/.v21i1.50 |
| Chicago | Абдикаримов, А.Э., Юсупов, А., and Атамуратов, А.Э. “INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR.” O‘zbekiston fizika jurnali, 21(1), 50-52 (2019). https://doi.org/10.52304/.v21i1.50 |
| Harvard | Абдикаримов, А.Э., Юсупов, А., and Атамуратов, А.Э (2019) ‘INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR’, O‘zbekiston fizika jurnali, 21(1), 50-52. https://doi.org/10.52304/.v21i1.50 |
| BibTeX | @article{article2019,
title = {INFLUENCE OF LATERAL EXPANSION OF THE GATE ON SHORT-CHANNEL EFFECTS IN A NANOMETER SOI FinFET TRANSISTOR},
author = {Абдикаримов, А.Э. and Юсупов, А. and Атамуратов, А.Э.},
journal = {O‘zbekiston fizika jurnali},
year = {2019},
volume = {21},
number = {1},
pages = {50-52},
doi = {10.52304/.v21i1.50},
url = {https://doi.org/10.52304/.v21i1.50}
} |
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