INFLUENCE OF TECHNOLOGICAL IMPURITIES ON THE FORMATION OF RADIATION DEFECTS IN SILICON WITH TRANSITION ELEMENTS

Sharifa B. Utamuradova, D. A. Rakhmanov

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали · 2021-yil

Annotatsiya

The purpose of this work is to study the influence of the content of growth impurities (oxygen and carbon) on the formation of radiation defects (RD) in Si with transition elements irradiated with 60Co γ-quanta using the methods of deep level transient spectroscopy (DLTS).

Maqola ma’lumotlari
MualliflarSharifa B. Utamuradova, D. A. Rakhmanov
Jurnal(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали
Nashr sanasi2021-06-30
Jild3
Son3
Betlar18-20
Tilen
DOI10.37681/2181-1652-019-x-2021-3-3

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали jurnalidan boshqa maqolalar

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