In this article, the electrophysical properties of Ni/SiO₂/n-Si metal-oxide-semiconductor (MOS) structures formed on n-type monocrystalline silicon substrates in the [111], [110], and [100] crystallographic orientations have been investigated. The study determined the influence of a thin tunnel oxide layer (2–4 nm) formed on the surface of the semiconductor monocrystalline substrate on the Schottky barrier parameters depending on the crystallographic orientation by analyzing their current-voltage characteristics (I-V). Based on the experimental results, energy band diagrams of the MOS structures were constructed, taking into account the interface states at the SiO₂/Si boundary. It was found that the Schottky barrier height changes depending on the crystallographic orientation of the substrate surface as φB[111] > φB[100] > φB[110]. The obtained results serve as a scientific basis for designing optimal parameters of microelectronic sensors and photoelectric converters with high sensitivity and selectivity.
| Mualliflar | E. Arzikulov, T. Sharofova, 呂紹瑋, Teng Liu, Zhisheng Nong, S. Sattarov |
|---|---|
| Jurnal | Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi |
| Nashriyot | Самарқанд давлат университети |
| ISSN | 2091-5446, 2181-1296 |
| Nashr sanasi | 2026-07-01 |
| Jild | 1 |
| Son | 3 |
| Betlar | 68-75 |
| Til | Ingliz |
| Ilmiy soha | Kimyo |
| DOI | 10.59251/2181-3973.2025.v1.138.1.3889 |
| Indeksga qo‘shilgan | 2026-09-02 |
DOI: 10.59251/2181-3973.2025.v1.138.1.3889 · Maqolaning asl sahifasi
| APA | E. Arzikulov, T. Sharofova, 呂紹瑋, Teng Liu, Zhisheng Nong, & S. Sattarov (2026). INFLUENCE OF THE CRYSTALLOGRAPHIC ORIENTATION OF THE MONOCRYSTALLINE SUBSTRATE ON THE CURRENT–VOLTAGE CHARACTERISTICS OF NI/SIO₂/N-SI STRUCTURES. Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi, 1(3), 68-75. https://doi.org/10.59251/2181-3973.2025.v1.138.1.3889 |
|---|---|
| GOST (OAK) | E. Arzikulov va b. INFLUENCE OF THE CRYSTALLOGRAPHIC ORIENTATION OF THE MONOCRYSTALLINE SUBSTRATE ON THE CURRENT–VOLTAGE CHARACTERISTICS OF NI/SIO₂/N-SI STRUCTURES // Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi. – 2026. – T. 1, № 3. – P. 68-75. – DOI: 10.59251/2181-3973.2025.v1.138.1.3889. |
| MLA | E. Arzikulov, T. Sharofova, 呂紹瑋, Teng Liu, Zhisheng Nong, and S. Sattarov. “INFLUENCE OF THE CRYSTALLOGRAPHIC ORIENTATION OF THE MONOCRYSTALLINE SUBSTRATE ON THE CURRENT–VOLTAGE CHARACTERISTICS OF NI/SIO₂/N-SI STRUCTURES.” Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi, 1(3), 68-75, 2026. https://doi.org/10.59251/2181-3973.2025.v1.138.1.3889 |
| Chicago | E. Arzikulov, T. Sharofova, 呂紹瑋, Teng Liu, Zhisheng Nong, and S. Sattarov. “INFLUENCE OF THE CRYSTALLOGRAPHIC ORIENTATION OF THE MONOCRYSTALLINE SUBSTRATE ON THE CURRENT–VOLTAGE CHARACTERISTICS OF NI/SIO₂/N-SI STRUCTURES.” Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi, 1(3), 68-75 (2026). https://doi.org/10.59251/2181-3973.2025.v1.138.1.3889 |
| Harvard | E. Arzikulov, T. Sharofova, 呂紹瑋, Teng Liu, Zhisheng Nong, and S. Sattarov (2026) ‘INFLUENCE OF THE CRYSTALLOGRAPHIC ORIENTATION OF THE MONOCRYSTALLINE SUBSTRATE ON THE CURRENT–VOLTAGE CHARACTERISTICS OF NI/SIO₂/N-SI STRUCTURES’, Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi, 1(3), 68-75. https://doi.org/10.59251/2181-3973.2025.v1.138.1.3889 |
| BibTeX | @article{earzikulov2026,
title = {INFLUENCE OF THE CRYSTALLOGRAPHIC ORIENTATION OF THE MONOCRYSTALLINE SUBSTRATE ON THE CURRENT–VOLTAGE CHARACTERISTICS OF NI/SIO₂/N-SI STRUCTURES},
author = {E. Arzikulov and T. Sharofova and 呂紹瑋 and Teng Liu and Zhisheng Nong and S. Sattarov},
journal = {Samarqand davlat universiteti ilmiy tadqiqotlar axborotnomasi},
year = {2026},
volume = {1},
number = {3},
pages = {68-75},
doi = {10.59251/2181-3973.2025.v1.138.1.3889},
url = {https://doi.org/10.59251/2181-3973.2025.v1.138.1.3889}
} |
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