GENERATION OF THERMODONORS IN SILICON DOPED WITH NICKEL DURING GROWTH

K. A. Ismailov, E. J. Kosbergenov

(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали · 2021-yil

Annotatsiya

In this work, it is shown that the introducti on of nickel atoms in the process of growing a silicon crystal makes it possible to obtain a mate rial with stable electrophysical parameters during thermal annealing at a temperature of 450 Ԩand durations t = 0.5÷25 hours. This is the most cost-effective way to create a material for semiconductor devices with stable parameters

Maqola ma’lumotlari
MualliflarK. A. Ismailov, E. J. Kosbergenov
Jurnal(2019) Яримўтказгичлар физикаси ва микроэлектроника журнали
Nashr sanasi2021-04-30
Jild3
Son2
Betlar16-19
Tilen
DOI10.37681/2181-1652-019-x-2021-2-2

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