FROM EXPERIMENTAL RESEARCH METHODS: ADVANTAGES AND DISADVANTAGES OF THE MAGNETRON SPUTTERING METHOD

Sobirova , Tursunoy

Innovation science and technologiy · 2026-yil

Annotatsiya

Magnetron sputtering vacuum deposition (MSVD) has undergone significant development since itsinception. This review examines the evolution of MSVD, its fundamental principles, various techniques (including jetsputtering, pulsed magnetron sputtering, and high-power pulsed magnetron sputtering), and its wide range of industrialapplications.While highlighting key advantages such as high deposition rates, versatility in material selection, and precise controlover film properties, the review also addresses inherent challenges, including low target utilization and plasma instability.A significant portion of the study focuses on the important role of MSVD in the automotive industry, emphasizing itsapplication in producing durable, high-quality coatings for both aesthetic and functional purposes.In addition, the transition from traditional electroplating methods to environmentally sustainable MSVD technologiesis discussed, reflecting the growing demand for cleaner and more efficient manufacturing processes.

Maqola ma’lumotlari
MualliflarSobirova , Tursunoy
JurnalInnovation science and technologiy
Nashr sanasi2026-04-01
Jild2
Son4
TilIngliz
DOI10.5281/zenodo.20049106

Kalit so‘zlar

magnetron sputtering, thin films, plasma, vacuum technology, sputtering, semiconductors, electronics, metal oxides

Ilmiy soha

Innovation science and technologiy jurnalidan boshqa maqolalar

Innovation science and technologiy — barcha maqolalar