AI and ML-Enhanced Nano Positioning for Large-Scale XY Scanning Applications

Yadav, Balkrishna Rasiklal

Innovative Multidisciplinary Journal of Applied Technology · 2023-yil

Annotatsiya

In this study, an XY flexure stage that provides a variety of motion options while reducing incorrect motions is designed and assessed. In the flexure design, the double parallelogram flexure modules are positioned methodically and symmetrically. The performance of the flexure stage is assessed using finite element analysis, and experimental testing is performed to validate the findings. The built-in prototype of the flexure stage has dimensions of 350 mm x 350 mm, a motion range of 7 mm x 7 mm, cross-axis flaw of less than 15 microns, and yaw flaws of less than 5 microradians. For precise applications in domains like semiconductor production, microscopy, and nanotechnology, nano positioning systems are essential. In an XY mechanism, achieving a wide scanning range while preserving nanometer accuracy poses difficulties about mechanical limitations, control accuracy, and structural stability. The basic ideas, importance, and benefits of nano positioning in long-range XY scanning methods are examined in this article. Important design factors, actuation methods, and control schemes required to accomplish high-performance positioning are covered.

Maqola ma’lumotlari
MualliflarYadav, Balkrishna Rasiklal
JurnalInnovative Multidisciplinary Journal of Applied Technology
Nashr sanasi2023-10-29
Jild1
Son1
Betlar106-111
TilIngliz

Kalit so‘zlar

Flexure stage, FEA, Double Parallelogram Flexure, cross axis flaw

Ilmiy soha

Innovative Multidisciplinary Journal of Applied Technology jurnalidan boshqa maqolalar

Innovative Multidisciplinary Journal of Applied Technology — barcha maqolalar